Biographical Information:

BSc in Electrical Engineering, Cairo University, 1973 MSc in Electrical Engineering, Stanford University, 1976 PhD in Electrical Engineering, Stanford University, 1983.
IBM T. J. Watson Research Laboratory, Yorktown Heights, NY, 1977 and 1980-81. Microelectronics Center of North Carolina, summer 1988. Hewlett-Packard Integrated Circuits Business Division, Deer Cree, Palo Alto, CA, 1992.

ECE Department Duke: since 1983.

Research Interests:

MOS Dielectrics: Technology, Physics, Modeling and Simulation. Ultrathin Oxide Growth Kinetics. Electrical Properties Of Ultrathin Oxides. Tunneling in Ultrathin Dielectrics (TUNNEL PISCES). Effects of Gate Tunneling Currents on the Performance of Future Generations of Static and Dynamic MOS Integrated Circuits. Nanoscale Device Physics, Modeling, Simulation, and Technology (with applications in biology, photonics, NEMS).

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